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期刊
ISSN
0016-4232
刊名
Galvanotechnik
参考译名
电镀技术
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1998~2024
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2000, vol.91, no.1
2000, vol.91, no.10
2000, vol.91, no.11
2000, vol.91, no.12
2000, vol.91, no.2
2000, vol.91, no.3
2000, vol.91, no.4
2000, vol.91, no.5
2000, vol.91, no.6
2000, vol.91, no.7
2000, vol.91, no.8
2000, vol.91, no.9
题名
作者
出版年
年卷期
A fundamentally new mechanism for additive metallization of polymeric substrates in ultra fine line technology illustrated for 3D-MIDs
Naundorf, G.; Wissbrock, H.
2000
2000, vol.91, no.9
Characterising plasmas in ion- and plasma enhanced PVD processes
Stauss, G. N.
2000
2000, vol.91, no.9
Direct current supply in a modern plating plant
Munk, F.
2000
2000, vol.91, no.9
High-strength nanocrystalline nickel-tungsten alloys produced by electrodeposition
Yamasaki, T.
2000
2000, vol.91, no.9
Improved cost-effectiveness of decorative plating plants by reducing or eliminating effluent discharge
Pies, P.
2000
2000, vol.91, no.9
Measurement and correction of macro-stress in electrodeposits
Heiner, R.; Heuberger, U.; Pfund, A.; Zielonka, A.
2000
2000, vol.91, no.9
New cyanide- and sulphite-free gold deposition processes
Simon F.; Kuhn, W.
2000
2000, vol.91, no.9
Powder coatings, pre-treatment and quality control of aluminum for architectural applications
Pietschmann, J.; Jehn, H.
2000
2000, vol.91, no.9
PVD Thin-film technology to produce customised surfaces
Lugscheider, E.; Bobzin, K.; Barwulf, St.
2000
2000, vol.91, no.9
Spray forming composite combustion chamber structures
Vlcek, J.; H. Huber; J. Kretschmer; T. Schenkel; H. Voggenreiter
2000
2000, vol.91, no.9
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