中国机械工程学会生产工程分会知识服务平台

期刊


ISSN0913-5685
刊名電子情報通信学会技術研究報告
参考译名电子信息通信学会技术研究报告：硅器件和材料
收藏年代2000～2024



全部

2000 2001 2002 2009 2013 2014
2015 2017 2020 2021 2022 2023
2024

2000, vol.100, no.295 2000, vol.100, no.296 2000, vol.100, no.373 2000, vol.100, no.374 2000, vol.100, no.477 2000, vol.100, no.517
2000, vol.100, no.603 2000, vol.100, no.652 2000, vol.100, no.653 2000, vol.100, no.668

题名作者出版年年卷期
Fluorine passivation technology on metal surfaceHiroto Izumi; Yoshihiro Kikunaga; Masatsugu Kawawaki; Hirohisa Kikuyama; Toshihisa Sakurai; Tadahiro Ohmi20002000, vol.100, no.374
A study of the qualities of silicon oxide film formed and CVD silicon oxide film irradiated by high-density Kr/O{sub}2 mixed plasma at low temperatureJun Takano; Yuji Saito; Toshihisa Sakurai; Tadahiro Ohmi; Tatsuhiro Yabune20002000, vol.100, no.374
Adsorption of SiH{sub}4 on Si(100)Masanori Shinohara; Akio Seyama; Nozomu Kamakura; Yasuo Kimura; Michio Niwano20002000, vol.100, no.374
Silane adsorption processes on SiGe surfacesNozomu Kamakura; Akio Seyama; Masanori Shinohara; Yasuo Kimura; Michio Niwano20002000, vol.100, no.374
Effect of pre-cleaning of SiGe selective epitaxial growth on HBT characteristicsY. Kiyota; K. Oda; E. Ohue; R. Hayami; M. Kondo; K. Washio; M. Tanabe; H. Shimamoto; O. Yamaguchi; T. Inada20002000, vol.100, no.374
Mechanism of oxide formation on Si surfaces in fluorine-based solution and the effect of residual oxide on solicitation processYoshihiro Sugita20002000, vol.100, no.374
Suppression of inverse narrow channel effects by novel shallow trench isolation fabrication process with rapid thermal oxidation for linear and gate oxide formationK. Shiozawa; K. Horita; Y. Itoh; H. Umeda; T. Uchida; K. Goto; T. Kuroi; Y. Tokuda; Y. Inoue; S. Satoh; M. Inuishi20002000, vol.100, no.374
Electromigration performance of damascene interconnects with Cu/Ti/TiN/Ti layered structureKazuhide Abe; Syunichi Tokitoh; Hiroshi Onoda20002000, vol.100, no.374
High-efficiency silicon CMOS power amplifier for GHz-band digital cellular systemM. Yokoyama; R. Tachibana; K. Tsubouchi20002000, vol.100, no.374



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