中国机械工程学会生产工程分会知识服务平台

期刊


ISSN0913-5685
刊名電子情報通信学会技術研究報告
参考译名电子信息通信学会技术研究报告：硅器件和材料
收藏年代2000～2024



全部

2000 2001 2002 2009 2013 2014
2015 2017 2020 2021 2022 2023
2024

2001, vol.101, no.107 2001, vol.101, no.108 2001, vol.101, no.246 2001, vol.101, no.247 2001, vol.101, no.320 2001, vol.101, no.321
2001, vol.101, no.350 2001, vol.101, no.430 2001, vol.101, no.515 2001, vol.101, no.571 2001, vol.101, no.573 2001, vol.101, no.718
2001, vol.101, no.719

题名作者出版年年卷期
New manufacturing technology concept in the 300mm eraAtsuyoshi Koike20012001, vol.101, no.350
Influence of organic contamination on electrical property of gate oxidesMasao Inoue; Kanji Takahashi; Akinobu Teramoto; Yasuhiko Horie; Tatsunori Kaneoka; Yoshikazu Ohno; Eiji Hara; Junji Kobayashi20012001, vol.101, no.350
Development of MIM/Ta{sub}2O{sub}5 capacitor process for 0.10μm-DRAMIsamu Asano; Yoshitaka Nakamura; Masahiko Hiratani; Toshihide Nabatame; Shinpei Iijima; Tomonori Saeki; Takuya Futase; Satoshi Yamamoto; Tatsuyuki Saito; Toshihiro Sekiguchi20012001, vol.101, no.350
Growth and doping mechanism in Si gas-source MBE in-situ doped with phosphorusMaki Suemitsu; Yoshikazu Tsukidate20012001, vol.101, no.350
Adsorption of organic contaminants on Si-wafer surface under vacuumTeruyuki Hayashi; Kaname Suzuki; Misako Saito; Sigetoshi Sugawa; Tadahiro Ohmi20012001, vol.101, no.350
Adhesion behavior of trace impurities remain in ultrapure water to silicon wafer surfaceMasahiko Kogure; Takahiro Yonehara; Toshihisa Sakurai; Tadahiro Ohmi20012001, vol.101, no.350
Theoretical study of silicon wafer pollutionToshiyuki Yokosuka; Hideyuki Seta; Seiichi Takami; Momoji Kubo; Akira Miyamoto; Takeshi Takatsuka20012001, vol.101, no.350
Photoresist developer reclamation technology from spent developer using an electrodialysis methodHiroshi Sugawara; Yoshinori Tajima; Tadahiro Ohmi20012001, vol.101, no.350
Photo resist stripping using oxidant controlled SOMHiroshi Tomita; Motoyuki Sato; Soichi Nadahara; Takayuki Saitoh; Tomonori Kojimaru; Yusuke Muraoka20012001, vol.101, no.350
A study of the etchant for FPD glass substrateTatsuhiro Yabune; Toshihisa Sakurai; Tadahiro Ohmi; Keiichi Nii; Kanenori Itoh; Hirohisa Kikuyama20012001, vol.101, no.350
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