中国机械工程学会生产工程分会知识服务平台

期刊


ISSN0741-3106
刊名IEEE Electron Device Letters
参考译名IEEE电子器件快报
收藏年代1998~2007



全部

1998 1999 2000 2001 2002 2003
2004 2005 2006 2007

2002, vol.23, no.1 2002, vol.23, no.10 2002, vol.23, no.11 2002, vol.23, no.12 2002, vol.23, no.2 2002, vol.23, no.3
2002, vol.23, no.4 2002, vol.23, no.5 2002, vol.23, no.6 2002, vol.23, no.7 2002, vol.23, no.8 2002, vol.23, no.9

题名作者出版年年卷期
Effects of Sc{sub}2O{sub}3 and MgO passivation layers on the output power of AlGaN/GaN HEMTsJ. K. Gillespie; R. C. Fitch; J. Sewell; R. Dettmer; G. D. Via; A. Crespo; T. J. Jenkins; B. Luo; R. Mehandru; J. Kim; F. Ren; B. P. Gila; A. H. Onstine; C. R. Abernathy; S. J. Pearton20022002, vol.23, no.9
Self-aligned GaAs p-channel enhancement mode MOS heterostructure field-effect transistorMatthias Passlack; Jonathan K. Abrokwah; Ravi Droopad; Zhiyi Yu; Corey Overgaard; Sang In Yi; Michael Hale; Jonathan Sexton; Andrew C. Kummel20022002, vol.23, no.9
Low ballistic mobility in submicron HEMTsMichael S. Shur20022002, vol.23, no.9
A high performance MIM capacitor using HfO{sub}2 dielectricsHang Hu; Chunxiang Zhu; Y. F. Lu; M. F. Li; Byung Jin Cho; W. K. Choi20022002, vol.23, no.9
The role of grain-boundary on the hydrogen-induced degradation in thin-film ferroelectric capacitorJang-Sik Lee; Seung-Ki Joo20022002, vol.23, no.9
Silicon-based high-Q inductors incorporating electroplated copper and low-K BCB dielectricXiao Huo; Kevin J. Chen; Philip C. H. Chan20022002, vol.23, no.9
Electrically programmable fuse (eFUSE) using electromigration in silicidesC. Kothandaraman; Sundar K. Iyer; Subramanian S. Iyer20022002, vol.23, no.9
Polarity-dependent dielectric breakdown-induced epitaxy (DBIE) in Si MOSFETsC. H. Tung; K. L. Pey; W. H. Lin; M. K. Radhakrishnan20022002, vol.23, no.9
Effect of the nitrous oxide plasma treatment on the MIM capacitorC. H. Ng; S-. F. Chu20022002, vol.23, no.9
Design of IGBT with integral freewheeling diodeEttore Napoli; Paolo Spirito; Antonio G. M. Strollo; Ferruccio Frisina; Leonardo Fragapane; Domenico Fagone20022002, vol.23, no.9
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