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期刊
ISSN
0741-3106
刊名
IEEE Electron Device Letters
参考译名
IEEE电子器件快报
收藏年代
1998~2007
全部
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2007
2004, vol.25, no.1
2004, vol.25, no.10
2004, vol.25, no.11
2004, vol.25, no.12
2004, vol.25, no.2
2004, vol.25, no.3
2004, vol.25, no.4
2004, vol.25, no.5
2004, vol.25, no.6
2004, vol.25, no.7
2004, vol.25, no.8
2004, vol.25, no.9
题名
作者
出版年
年卷期
Monte Carlo Simulation of Schottky Diodes Operating Under Terahertz Cyclostationary Conditions
P. Shiktorov; E. Starikov; V. Gruzinskis; S. Perez; T. Gonzalez; L. Reggiani; L. Varani; J. C. Vaissiere
2004
2004, vol.25, no.1
Bias and Temperature Dependence of Sb-Based Heterostructure Millimeter-Wave Detectors With Improved Sensitivity
R. G. Meyers; P. Fay; J. N. Schulman; S. Thomas, III; D. H. Chow; J. Zinck; Y. K. Boegeman; P. Deelman
2004
2004, vol.25, no.1
High-Power Polarization-Engineered GaN/AlGaN/GaN HEMTs Without Surface Passivation
L. Shen; R. Coffie; D. Buttari; S. Heikman; A. Chakraborty; A. Chini; S. Keller; S. P. DenBaars; U. K. Mishra
2004
2004, vol.25, no.1
Contact Resistance Measurement of Bonded Copper Interconnects for Three-Dimensional Integration Technology
K. N. Chen; A. Fan; C. S. Tan; R. Reif
2004
2004, vol.25, no.1
TDDB and Polarity-Dependent Reliability of High-Quality, Ultrathin CVD HfO{sub}2 Gate Stack With TaN Gate Electrode
Sungjoo Lee; D. L. Kwong
2004
2004, vol.25, no.1
A New Junction Termination Method Employing Shallow Trenches Filled With Oxide
Jae-Keun Oh; Min-Woo Ha; Min-Koo Han; Yearn-Ik Choi
2004
2004, vol.25, no.1
A Nondestructive Approach to Predict the Failure Time of Thin-Film Interconnects Under High-Stress Current
M. Islam; E. Misra; H. C. Kim; Mahbub Hasan; T. L. Alford
2004
2004, vol.25, no.1
Light Guide for Pixel Crosstalk Improvement in Deep Submicron CMOS Image Sensor
T. H. Hsu; Y. K. Fang; C. Y. Lin; S. F. Chen; C. S. Lin; D. N. Yaung; S. G. Wuu; H. C. Chien; C. H. Tseng; J. S. Lin; C. S. Wang
2004
2004, vol.25, no.1
Poly-Si TFTs With Asymmetric Dual-Gate for Kink Current Reduction
Min-Cheol Lee; Min-Koo Han
2004
2004, vol.25, no.1
A Novel Low-Voltage N-Channel Heterostructure Dynamic Threshold Voltage MOSFET (N-HDTMOS) With p-Type Doped SiGe Body
Takahiro Kawashima; Yoshihiro Kara; Yoshihiko Kanzawa; Haruyuki Sorada; Akira Inoue; Akira Asai; Takeshi Takagi
2004
2004, vol.25, no.1
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