中国机械工程学会生产工程分会知识服务平台

期刊


ISSN0018-9219
刊名Proceedings of the IEEE
参考译名电气与电子工程师学会会报
收藏年代1998~2013



全部

1998 1999 2000 2001 2002 2003
2004 2005 2006 2007 2008 2009
2010 2011 2012 2013

2001, vol.89, no.10 2001, vol.89, no.11 2001, vol.89, no.12 2001, vol.89, no.2 2001, vol.89, no.3 2001, vol.89, no.4
2001, vol.89, no.5 2001, vol.89, no.6 2001, vol.89, no.7 2001, vol.89, no.8 2001, vol.89, no.9

题名作者出版年年卷期
Fundamental limits of silicon technologyRobert W. Keyes20012001, vol.89, no.3
Material and process limits in silicon VLSI technologyJames D. Plummer; Peter B. Griffin20012001, vol.89, no.3
Device scaling limits of Si MOSFETs and their application dependenciesDavid J. Frank; Robert H. Dennard; Edward Nowak; Paul M. Solomon; Yuan Taur; Hon-Sum Philip Wong20012001, vol.89, no.3
Analog at milepost 2000: a personal perspectiveBarrie Gilbert20012001, vol.89, no.3
Interconnect limits on gigascale integration (GSI) in the 21st centuryJeffrey A. Davis; Raguraman Venkatesan; Alain Kaloyeros; Michael Beylansky; Shukri J. Souri; Kaustav Banerjee; Krishna C. Saraswat; Arifur Rahman; Rafael Reif; James D. Meindl20012001, vol.89, no.3
Coming challenges in microarchitecture and architectureRonny Ronen; Avi Mendelson; Konrad Lai; Shih-Lien Lu; Fred Pollack; John P. Shen20012001, vol.89, no.3
Limitations and challenges of computer-aided design technology for CMOS VLSIRandal E. Bryant; Kwang-Ting Cheng; Andrew B. Kahng; Kurt Keutzer; Wojciech Maly; Richard Newton; Lawrence Pileggi; Jan M. Rabaey; Alberto Sangiovanni-Vincentelli20012001, vol.89, no.3
Limits of lithographyLloyd R. Harriott20012001, vol.89, no.3
Limits of integrated-circuit manufacturingRobert Doering; Yoshio Nishi20012001, vol.89, no.3
New paradigm of silicon technologyTadahiro Ohmi; Shigetoshi Sugawa; Koji Kotani; Masaki Hirayama; Akihiro Morimoto20012001, vol.89, no.3