中国机械工程学会生产工程分会知识服务平台

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ISSN0367-5874
刊名日立評論
参考译名日立评论
收藏年代1998～2023



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2002, vol.84, no.2 2002, vol.84, no.3 2002, vol.84, no.4 2002, vol.84, no.5 2002, vol.84, no.6

题名作者出版年年卷期
E-manufacturing system for next-generation semiconductor productionYasutsugu Usami; Hideyuki Yamamoto; Motoya Taniguchi; Isao Kawata; Hiroyoshi Mori20022002, vol.84, no.3
Semiconductor process and manufacturing technologies for sub-100 μm process generationTakafumi Tokunaga; Katsutaka Kimura; Jun Nakazato; Fumiyuki Kanai20022002, vol.84, no.3
High-performance electron beam mask writerGen'ya Matsuoka; Kazui Mizuno; Takashi Matsuzaka; Koji Nagata20022002, vol.84, no.3
UHF-ECR plasma etching system for gate electrode processingShinji Kawamura; Naoshi Itabashi; Akitaka Makino; Masamichi Sakaguchi20022002, vol.84, no.3
Slimming system using ozone process technologyHiromichi Kawasaki; Sukeyoshi Tsunekawa; Hiroshi Kawakami; Norio Hasegawa20022002, vol.84, no.3
Vertical deposition system for sub-100 nm devicesYasuo Kunii; Yasuhiro Inokuchi; Akihiro Miyauchi20022002, vol.84, no.3
Advanced process control technologies for semiconductor thermal processesMitsuhiro Matsuda; Toshimitsu Miyata; Masakazu Shimada; Tomoji Watanabe20022002, vol.84, no.3
High-current ion implanter for 300 mm-diameter SIMOX wafer productionKazuo Mera; Hiroyuki Tomita; Katsumi Tokiguchi; Kenji Odaka20022002, vol.84, no.3
Semiconductor yield enhancement solution for next generationNaoyuki Eguchi; Seiji Isogai; Yasutsugu Usami20022002, vol.84, no.3
New CD-SEM system for sub-100 nm process generationOsamu Nasu; Katsuhiro Sasada; Mitsuji Ikeda; Makoto Ezumi20022002, vol.84, no.3
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