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期刊

ISSN	0913-5685
刊名	電子情報通信学会技術研究報告
参考译名	电子信息通信学会技术研究报告：可靠性
收藏年代	2000～2024

全部

2000	2001	2002	2003	2004	2005
2006	2007	2008	2009	2010	2011
2012	2013	2014	2015	2016	2017
2018	2019	2020	2021	2022	2023
2024

2015, vol.115, no.100	2015, vol.115, no.101	2015, vol.115, no.102	2015, vol.115, no.103	2015, vol.115, no.104	2015, vol.115, no.106
2015, vol.115, no.107	2015, vol.115, no.108	2015, vol.115, no.115	2015, vol.115, no.119	2015, vol.115, no.124	2015, vol.115, no.126
2015, vol.115, no.13	2015, vol.115, no.133	2015, vol.115, no.135	2015, vol.115, no.137	2015, vol.115, no.14	2015, vol.115, no.142
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2015, vol.115, no.88	2015, vol.115, no.9

题名	作者	出版年	年卷期
化学気相成長法を用いて作製した単層グラフェンの積層による2層グラフェンの作製と電気特性	星野崚; 林佑太郎; 今井健太郎; 鈴木希; 永田知子; 岩田展幸; 山本寛	2015	2015, vol.115, no.103
YAlO_3（001）基板表面処理条件の違いによるCr_2O_3薄膜の結晶成長	橋本浩佑; 隅田貴士; 林佑太郎; 福井慎二郎; 永田知子; 山本寛; 岩田展幸	2015	2015, vol.115, no.103
大気圧CVD法による酸化スズ及び酸化ガリウムナノワイヤーの成長	寺迫智昭; 倉重利規; 矢木正和	2015	2015, vol.115, no.103
触媒反応支援CVD法によるガラス基板上ZnO膜成長におけるN_2O添加初期層の効果	叶内慎吾; 石塚侑己; 大橋優樹; 大石耕一郎; 片桐裕則; 玉山泰宏; 安井寛治	2015	2015, vol.115, no.103
触媒反応生成高エネルギーH_2Oビームのノズル開口角依存性	寺口祐介; 田島諒一; 中村友紀; 高橋一匡; 玉山泰宏; 安井寛治	2015	2015, vol.115, no.103
統計的手法を用いた微摺動機構による電気接点劣化現象解析～いくつかの実験条件下における最小摺動振幅データを用いた統計解析	越田圭治; 和田真一; 久保田洋彰; 澤孝一郎	2015	2015, vol.115, no.103
金属ガラス薄帯へのアルミニウム薄板の電磁圧接	相沢友勝; 松澤和夫; 網谷健児	2015	2015, vol.115, no.103
異なる電極開離速度におけるAgSnO_2接点対による直流負荷電流遮断時のアーク放電特性に関する実験的検討	長谷川誠	2015	2015, vol.115, no.103
電界誘起光第2次高調波発生法による有機材料中の3次元電界評価	間中孝彰; 岩本光正	2015	2015, vol.115, no.103
ペチーニ法で作製したBi_(1+x))FeO_3（X＝0.0,0.2）ターゲットおよびパルスレーザー堆積法で作製したBiFeO_3薄膜の化学当量性の評価	王春; 大島佳祐; 稲葉隆哲; 宋華平; 渡部雄太; 永田知子; 橋本拓也; 高瀬浩一; 山本寛; 岩田展幸	2015	2015, vol.115, no.103