中国机械工程学会生产工程分会知识服务平台

期刊


ISSN1555-130X
刊名Journal of Nanoelectronics and Optoelectronics
参考译名纳米电子与光电子杂志
收藏年代2006~2023



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2010, vol.5, no.1 2010, vol.5, no.2 2010, vol.5, no.3

题名作者出版年年卷期
Modeling Based Design of Graphene Heat Spreaders and Interconnects in 3-D Integrated CircuitsSamia Subrina20102010, vol.5, no.3
A Two-Dimensional Model for the Surface Potential and Subthreshold Current of Doped Double-Gate (DG) MOSFETs with a Vertical Gaussian-Like Doping ProfileSarvesh Dubey; Pramod Kumar Tiwari; S. Jit20102010, vol.5, no.3
Modeling and Estimation of Band to Band Tunneling Current for Nanoscale Metal Gate (Hf/AlN_x) Symmetric Double Gate MOSFETS. K. Vishvakarma; V. Komal Kumar; A. K. Saxena; S. Dasgupta20102010, vol.5, no.3
Design and Simulation of a Sequence Generator using Single Electron Devices and Hybrid ArchitectureDebasis Samanta; Ankush Ghosh; Souvik Sarkar; Subir Kumar Sarkar20102010, vol.5, no.3
Nanofocusing of Surface Plasmons at the Apex of Metallic Probe TipsAndrey Petrin20102010, vol.5, no.3
Performance Analysis of a Single-Electron Winner-Take-All Fully-Interconnected NetworkJanaina Goncalves Guimaraes; Jose Camargo da Costa20102010, vol.5, no.3
Preparation and Characteristics of Flexible Nanorod-Based PhotodetectorsL. W. Ji; C. Z. Wu; T. H. Fang; S. M. Peng; S. J. Young; W. Water; T. H. Meen; C. H. Liu20102010, vol.5, no.3
Synthesis of Nano-Structured Sb_2Te_3 Thin Films by Stacked Elemental Layer MethodS. Shanmugan; D. Mutharasu20102010, vol.5, no.3
Impact of Gate Engineering on Gate Leakage Behavior of Nano Scale MOSFETs with High-k DielectricsAshwani K. Rana; Narottam Chand; Vinod Kapoor20102010, vol.5, no.3
High Frequency Transport of Two-Dimensional Hot Electrons in CdS Quantum Well with Inserted Barrier LayerSanjoy Deb; N. Basanta Singh; Asish Kumar De; S. K. Sarkar20102010, vol.5, no.3
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