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0913-5685
刊名
電子情報通信学会技術研究報告
参考译名
电子信息通信学会技术研究报告:可靠性
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2016, vol.116, no.1
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题名
作者
出版年
年卷期
Development of recombination layer in Perovskite/Microcrystalline Si tandem solar cells
Song Zhang; Yasuaki Yishikawa; Itaru Raifuku; Tiphaine Bourgeteau; Yukiharu Uraoka; Erik Johnson; Martin Foldyna; Yvan Bonnassieux; Pere Roca i Cabarrocas
2016
2016, vol.116, no.355
ミストCVD法で作製したGaSnO薄膜の特性評価
福嶋大貴; 弓削政博; 木村睦; 松田時宜
2016
2016, vol.116, no.355
新規レアメタルフリーAOS TFTの研究開発
梅田鉄馬; 加藤雄太; 西本大樹; 松田時宜; 木村睦
2016
2016, vol.116, no.355
IGZO薄膜素子の磁気抵抗効果に対する電極の影響
符川明日香; 野村竜生; 松田時宜; 木村睦
2016
2016, vol.116, no.355
GaSnO膜のHall効果測定
今西恒太; 符川明日香; 松田時宜; 木村睦
2016
2016, vol.116, no.355
薄膜生体刺激デバイスのin-vitro実験
冨岡圭佑; 三宅康平; 松田時宜; 木村睦
2016
2016, vol.116, no.355
薄膜コイルを用いたワイヤレス電力伝送
山本友稀; 三澤慶悟; 松田時宜; 木村睦
2016
2016, vol.116, no.355
金属酸化物抵抗変化型メモリにおけるデータ保持特性の外部ストレス耐性
木下健太郎
2016
2016, vol.116, no.355
第一原理計算による多結晶酸化物薄膜の抵抗変化メカニズムの検討
森山拓洋; 肥田聡太; 山崎隆浩; 大野隆央; 岸田悟; 木下健太郎
2016
2016, vol.116, no.355
自己整合四端子平面型メタルダブルゲート低温poly-Si TFTから成るガラス上のCMOSインバータ
大澤弘樹; 原明人
2016
2016, vol.116, no.355
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