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期刊

ISSN	0913-5685
刊名	電子情報通信学会技術研究報告
参考译名	电子信息通信学会技术研究报告：可靠性
收藏年代	2000～2024

全部

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2024

2019, vol.119, no.10	2019, vol.119, no.102	2019, vol.119, no.114	2019, vol.119, no.115	2019, vol.119, no.12	2019, vol.119, no.127
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题名	作者	出版年	年卷期
真空蒸着法による硫化アンチモン薄膜堆積	高野泰; 井上翔	2019	2019, vol.119, no.271
極薄TaWN膜上のCu配向制御の検討	武山真弓; 佐藤勝	2019	2019, vol.119, no.271
窒素を添加したDLC膜特性へのアニール効果	長内公哉; 中村和樹; 郡山春人; 小林康之; 遠田義晴; 鈴木裕史; 末光眞希; 中澤日出樹	2019	2019, vol.119, no.271
触媒反応支援CVD法におけるZnO膜への窒素ドーピング	伊庭竜太; 神林広樹; 安達雄大; 大石耕一郎; 片桐裕則; 安井寛治	2019	2019, vol.119, no.271
招待講演触媒反応支援化学気相成長法を用いた金属酸化物薄膜の成長	安井寛治	2019	2019, vol.119, no.271
RFスパッタ法によって室温成膜されたZrN_x膜の特性	佐藤滕; 武山真弓	2019	2019, vol.119, no.271
高分子圧電体膜P（VDF-TrFE）をゲート絶縁膜に用いた一体型FETにおけるチャネル構造変化に伴う電気的特性の変化	松本周作; 岡山琢哉; 古川昭雄	2019	2019, vol.119, no.271
［招待講演］界面顕微光応答法による金属／半導体、半導体／半導体界面の2次元評価	塩島謙次	2019	2019, vol.119, no.271