中国机械工程学会生产工程分会知识服务平台

期刊


ISSN0913-5685
刊名電子情報通信学会技術研究報告
参考译名电子信息通信学会技术研究报告:可靠性
收藏年代2000~2023



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2018 2019 2020 2021 2022 2023

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题名作者出版年年卷期
Defect analysis of HfO_2/In_(0.53)Ga_(0.47)As interface using capacitance-voltage and conductance methodsZade Darius; Hosoi Ryuji; Ahmet Parhat; Kakushima Kuniyuki; Tsutsui Kazuo; Nishiyama Akira; Sugii Nobuyuki; Natori Kenji; Hattori Takeo; Iwai Hiroshi20112011, vol.111, no.114
Evaluation of Light Induced Damages in Plasma Process on Electrical Properties of Al_2O_3/Ge Gate Stack StructureKusumandari; Wakana Takeuchi; Kimihiko Katot; Shigehisa Shibayama; Mitsuo Sakashita; Osamu Nakatsuka; Shigeaki Zaima20112011, vol.111, no.114
Evaluation of Electrical Property at SrTiO_3 Bicrystal Interface by EBICTetsuji KATO; Son Phu Thanh PHAM; Yoshiaki NAKAMURA; Jun KIKKAWA; Akira SAKAI20112011, vol.111, no.114
グリーンレーザーによる積層構造シリコン薄膜の同時結晶化と薄膜デバイスへの応用堀田昌宏; 山崎浩司; 町田絵美; 石河泰明; 浦岡行治20112011, vol.111, no.114
相変化チャネルトランジスタを用いた積層型NOR PRAMの設計加藤翔; 渡辺重佳20112011, vol.111, no.114
Al_2O_3堆積膜をゲート絶縁膜に用いたSiC-MOSFETの作製と評価山田泰之; 石黒暁夫; 日野史郎; 三浦成久; 今泉昌之; 炭谷博昭; 徳光永輔20112011, vol.111, no.114
低消費電力型デバイスを用いたシステムLSIの設計法鈴木良輔; 渡辺重佳20112011, vol.111, no.114
高温熱処理とMIPS構造によるLa-Silicate/Si界面特性の改善と低EOTの実現川那子高暢; 角嶋邦之; Parhat Ahmet; 筒井一生; 西山彰; 杉井信之; 名取研二; 服部健雄; 岩井洋20112011, vol.111, no.114
Si高指数面酸化過程のリアルタイム光電子分光による評価大野真也; 井上慧; 森本真弘; 新江定憲; 豊島弘明; 吉越章隆; 寺岡有殿; 尾形祥一; 安田哲二; 田中正俊20112011, vol.111, no.114
XPS時間依存測定法によるSiO_2/Si界面の電荷トラップ密度の面方位依存性の評価石原由梨; 渋谷寧浩; 五十嵐智; 小林大輔; 野平博司; 上野和良; 廣瀬和之20112011, vol.111, no.114
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