中国机械工程学会生产工程分会知识服务平台

期刊


ISSN0946-7076
刊名Microsystem technologies
参考译名微系统技术：传感器，致动器与系统集成
收藏年代1998～2023

关联期刊参考译名收藏年代
Journal of Information Storage and Processing Systems存储与处理系统信息杂志2000～2001


全部

1998 1999 2000 2001 2002 2003
2004 2005 2006 2007 2008 2009
2010 2011 2012 2013 2014 2015
2016 2017 2018 2019 2020 2021
2022 2023

2010, vol.16, no.1/2 2010, vol.16, no.10 2010, vol.16, no.11 2010, vol.16, no.12 2010, vol.16, no.3 2010, vol.16, no.4
2010, vol.16, no.5 2010, vol.16, no.6 2010, vol.16, no.7 2010, vol.16, no.8/9

题名作者出版年年卷期
First automated production line for X-ray-LIGA (FELIG) is brought on lineLothar Hahn; Georg Schwartz; Volker Saile; Joachim Schulz20102010, vol.16, no.8/9
Synchrotron laboratory for micro and nano devices: facility concept and designSven Achenbach; Venkat Subramanian; David Klymyshyn; Garth Wells20102010, vol.16, no.8/9
Polyimide-based X-ray masks with advanced performance of pattern accuracy and thermal stabilitySeichin Kinuta; Yoshiaki Saita; Masashi Kobayashi; Martin Boerner; Volker Saile; Sumio Hosaka20102010, vol.16, no.8/9
Fabrication of X-rays mask with carbon membrane for diffraction gratingsNaoki Takahashi; Hiroshi Tujii; Megumi Katori; Kenji Yamashita; Daiji Noda; Tadashi Hattori20102010, vol.16, no.8/9
Fabrication of high precision X-ray mask for X-ray grating of X-ray Talbot interferometerDaiji Noda; Hiroshi Tsujii; Naoki Takahashi; Tadashi Hattori20102010, vol.16, no.8/9
Fabrication of X-ray imaging zone plates by e-beam and X-ray lithographyLonghua Liu; Gang Liu; Ying Xiong; Jie Chen; Wenjie Li; Yangchao Tian20102010, vol.16, no.8/9
Inclination of mold pattern's sidewalls by combined technique with photolithography at defocus-positions and electroformingHarutaka Mekaru; Osamu Koizumi; Akihisa Ueno; Masaharu Takahashi20102010, vol.16, no.8/9
Study on fabrication of 3-D microstructures by synchrotron radiation based on pixels exposed lithographyMitsuhiro Horade; Susumu Sugiyama20102010, vol.16, no.8/9
Resist-less patterning on SiO_2 by combination of X-ray exposure and vapor HF etchingHarutaka Mekaru; Makoto Fujimaki; Koichi Awazu; Masaharu Takahashi20102010, vol.16, no.8/9
Method development for epoxy resin analysisSawa Nordt; Harald Pasch; Wolfgang Radke20102010, vol.16, no.8/9
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