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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2013
2005, vol.23, no.1
2005, vol.23, no.2
2005, vol.23, no.3
2005, vol.23, no.4
2005, vol.23, no.5
2005, vol.23, no.6
题名
作者
出版年
年卷期
Properties of atmospheric pressure plasmas with microwave excitations for plasma processing
Mikio Nagai; Masaru Hori; Toshio Goto
2005
2005, vol.23, no.2
Etching mechanisms of Si and SiO{sub}2 in inductively coupled fluorocarbon plasmas: Correlation between plasma species and surface etching
F. Gaboriau; M.-C. Fernandez-Peignon; G. Cartry; Ch. Cardinaud
2005
2005, vol.23, no.2
Reactions of water and ethanol with polycrystalline TiC surfaces
Zhiying Chen; Scott S. Perry; Alan Savan; Paul M. Adams; Stephen V. Didziulis
2005
2005, vol.23, no.2
Optical properties and microstructure of plasma deposited Ta{sub}2O{sub}5 and Nb{sub}2O{sub}5 films
H. Szymanowski; O. Zabeida; J. E. Klemberg-Sapieha; L. Martinu
2005
2005, vol.23, no.2
Role of hydrogen on the deposition and properties of fluorinated silicon-nitride films prepared by inductively coupled plasma enhanced chemical vapor deposition using SiF{sub}4/N{sub}2/H{sub}2 mixtures
J. Fandino; G. Santana; L. Rodriguez-Fernandez; J. C. Cheang-Wong; A. Ortiz; J. C. Alonso
2005
2005, vol.23, no.2
Development of chemically assisted etching method for GaAs-based optoelectronic devices
M. Gaillard; A. Rhallabi; L. Elmonser; A. Talneau; F. Pommereau; Ph. Pagnod-Rossiaux; N. Bouadma
2005
2005, vol.23, no.2
Highly accurate coating composition control during co-sputtering, based on controlling plasma chromaticity
J. V. Anguita; M. Thwaites; B. Holton; P. Hockley; B. Holton; S. Rand
2005
2005, vol.23, no.2
Inductively coupled plasmas: Optimizing the inductive-coupling efficiency for large-area source design
P. Colpo; T. Meziani; F. Rossi
2005
2005, vol.23, no.2
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces
J. Alami; P. O. A. Persson; D. Music; J. T. Gudmundsson; J. Bohlmark; U. Helmersson
2005
2005, vol.23, no.2
Feedback control of chlorine inductively coupled plasma etch processing
Chaung Lin; Keh-Chyang Leou; Kai-Mu Shiao
2005
2005, vol.23, no.2
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