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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2003, vol.21, no.1 2003, vol.21, no.2 2003, vol.21, no.3 2003, vol.21, no.4 2003, vol.21, no.5 2003, vol.21, no.5sup
2003, vol.21, no.6

题名作者出版年年卷期
Measurement of the plasma potential adjacent to the substrate in a midfrequency bipolar pulsed magnetronS. K. Karkari; A. Vetushka; J. W. Bradley20032003, vol.21, no.6
Structural, electrical, and optical properties of diamondlike carbon films deposited by dc magnetron sputteringE. Broitman; O. P. A. Lindquist; N. Hellgren; L. Hultman; B. C. Holloway20032003, vol.21, no.6
Effects of indium surfactant on the crystalline and optical properties of GaN during initail growth stageHairong Yuan; Soo Jin Chua; Sudhiranjan Tripathy; Peng Chen20032003, vol.21, no.6
Effects of air exposure on ion beam assisted TiN:O coatings to prevent multipactorS. I. Castaneda; N. Diaz; D. Raboso; I. Montero; L. Galan; F. Rueda20032003, vol.21, no.6
Formation and clustering of individual point defects in pure tungsten and its slightly dilute alloys at ion irradiationA. L. Suvorov; A. G. Zaluzhnyi; V. P. Babaev; A. A. Zaluzhnyi20032003, vol.21, no.6
Characterization of nonstoichiometric TiO{sub}2 and ZrO{sub}2 thin films stabilized by Al{sub}2O{sub}3 and SiO{sub}2 additionsDong-Hau Kuo; Kuo-Hwa Tzeng; Chi-Hung Chien20032003, vol.21, no.6
Effects of CF{sub}4 addition on oxygen contamination of SiC films in hot filament chemical vapor deposition using CH{sub}4+SiH{sub}4+H{sub}2Guoju Wang; Bo Wang; Anping Huang; Mankang Zhu; Biben Wang; Hui Yan20032003, vol.21, no.6
Ion energy distributions and the density of CH{sub}3 radicals in a low pressure inductively coupled CH{sub}4/H{sub}2 plasma used for nanocrystalline diamond depositionKatsuyuki Okada; Shojiro Komatsu; Seiichiro Matsumoto20032003, vol.21, no.6
Experimental and computer simulation studies of the "baffled target" reactive sputtering processF. Engelmark; J. Westlinder; T. Nyberg; S. Berg20032003, vol.21, no.6
Radical detection in a methane plasmaH. D. Kang; V. Dose20032003, vol.21, no.6
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