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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2013
2006, vol.24, no.1
2006, vol.24, no.2
2006, vol.24, no.3
2006, vol.24, no.4
2006, vol.24, no.5
2006, vol.24, no.6
题名
作者
出版年
年卷期
Heat trapping for fast pumping of very hot gases
E. J. Petit
2006
2006, vol.24, no.6
Measurement of desorbed products during organic polymer thin film fetching by plasma beam irradiation
Kazuaki Kurihara; Kazuhiro Karahashi; Akihiro Egami; Moritaka Nakamura
2006
2006, vol.24, no.6
Effects of the growth conditions on the roughness of amorphous hydrogenated carbon films deposited by plasma enhanced chemical vapor deposition
G. Capote; R. Prioli; F. L. Freire, Jr.
2006
2006, vol.24, no.6
Deposition profile of Ti film inside a trench and its correlation with gas-phase ionization in high-pressure magnetron sputtering
N. Nafarizal; N. Takada; K. Nakamura; Y. Sago; K. Sasaki
2006
2006, vol.24, no.6
Structural, electrical, optical, and photoelectrochemical properties of thin titanium oxinitride films (TiO{sub}(2-2x)N{sub}x with 0≤x≤1)
U. Koslowski; K. Ellmer; P. Bogdanoff; T. Dittrich; T. Guminskaya; H. Tributsch
2006
2006, vol.24, no.6
Vapor phase reactions in polymerization plasma for divinylsiloxane-bis-benzocyclobutene film deposition
Keizo Kinoshita; Akinori Nakano; Jun Kawahara; Nobutaka Kunimi; Yoshihiro Hayashi; Osamu Kiso; Naoaki Saito; Keiji Nakamura; Takamaro Kikkawa
2006
2006, vol.24, no.6
Thin film deposition of barium strontium oxide by rf magnetron sputtering
Yan Liu; Christopher M. Day; Scott A. Little; Feng Jin
2006
2006, vol.24, no.6
In situ measurement of the ion incidence angle dependence of the ion-enhanced etching yield in plasma reactors
Rodolfo Jun Belen; Sergi Gomez; Mark Kiehlbauch; Eray S. Aydil
2006
2006, vol.24, no.6
Real-time monitoring of charge accumulation during pulse-time-modulated plasma
Hiroto Ohtake; Butsurin Jinnai; Yuya Suzuki; Shinnosuke Soda; Tadashi Shimmura; Seiji Samukawa
2006
2006, vol.24, no.6
Microstructural differences in thin film ZnGa{sub}2O{sub}4:Mn phosphor produced by differences in sputtering gas pressure
Joo Han Kim; Paul H. Holloway
2006
2006, vol.24, no.6
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