中国机械工程学会生产工程分会知识服务平台

期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2000, vol.18, no.1 2000, vol.18, no.6

题名作者出版年年卷期
Transient plasma-induced emission analysis of laser-desorbed species during Cl{sub}2 plasma etching of SiJae Young Choe; N. C. M. Fuller; Vincent M. Donnelly; Irving P. Herman20002000, vol.18, no.6
Titanium oxide films on Si(100) deposited by e-beam evaporationH. K. Jang; S. W. Whangbo; Y. K. Choi; Y. D. Chung; K. Jeong; C. N. Whang; Y. S. Lee; H. -S. Lee; J. Y. Choi; G. H. Kim; T. K. Kim20002000, vol.18, no.6
Tantalum etching with a nonthermal atmospheric-pressure plasmaV. J. Tu; J. Y. Jeong; A. Schutze; S. E. Babayan; G. Ding; G. S. Selwyn; R. F. Hicks20002000, vol.18, no.6
Surface loss coefficients of CF{sub}x and F radicals on stainless steelHarmeet Singh; J. W. Coburn; David B. Graves20002000, vol.18, no.6
Study of the double layer CeO{sub}2/Nb{sub}2O{sub}5 thin filmZaoli Zhang; Xinhua Du; Wendong Wang20002000, vol.18, no.6
Study of chemical vapor deposition diamond film evolution from a nanodiamond precursor by C{sup}13 isotopic labeling and ion implantationI. Gouzman; V. Richter; S. Rotter; A. Hoffman20002000, vol.18, no.6
Studies on plasma-nitrided iron by scanning electron microscopy, glancing angle X-ray diffraction, and X-ray photoelectron spectroscopyEduardo J. Miola; Sylvio D. de Souza; Pedro A. P. Nascente; Maristela Olzon-Dionysio; Carlos A. Olivieri; Dirceu Spinelli20002000, vol.18, no.6
Search for improved transparent conducting oxides: a fundamental investigation of CdO, Cd{sub}2SnO{sub}4, and Zn{sub}2SnO{sub}4T. J. Coutts; D. L. Young; X. Li; X. Wu; W. P. Mulligan20002000, vol.18, no.6
Scanning tunneling microscopy study of the Er/Ge(111) c(2×8 interface)S. Pelletier; E. Ehret; B. Gautier; F. Palmino; J. C. Labrune20002000, vol.18, no.6
Role of delocalized nitrogen in determining the local atomic arrangement and mechanical properties of amorphous carbon nitride thin filmsB. C. Holloway; O. Kraft; D. K. Shuh; W. D. Nix; M. Kelly; P. Pianetta; S. Hagstrom20002000, vol.18, no.6
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