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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2005, vol.23, no.1
2005, vol.23, no.2
2005, vol.23, no.3
2005, vol.23, no.4
2005, vol.23, no.5
2005, vol.23, no.6
题名
作者
出版年
年卷期
Batch process for atomic layer deposition of hafnium silicate thin films on 300-mm-diameter silicon substrates
Yoshi Okuyama; Carl Barelli; Christopher Tousseau; Seung Park; Yoshihide Senzaki
2005
2005, vol.23, no.3
Comprehensive analysis of chlorine-containing capacitively coupled plasmas
Gerhard Franz
2005
2005, vol.23, no.3
Removal of particles during plasma processes using a collector based on the properties of particles suspended in the plasma
Heru Setyawan; Manabu Shimada; Yutaka Hayashi; Kikuo Okuyama
2005
2005, vol.23, no.3
Low temperature, fast deposition of metallic titanium nitride films using plasma activated reactive evaporation
J. A. Montes de Oca Valero; Y. Le Petitcorps; J. P. Manaud; G. Chollon; F. J. Carrillo Romo; A. Lopez, M.
2005
2005, vol.23, no.3
Amorphous transparent conductive oxide films of ln{sub}2O{sub}3-ZnO with additional Al{sub}2O{sub}3 impurities
K. Tominaga; H. Fukumoto; K. Kondou; Y. Hayashi; K. Murai; T. Moriga; I. Nakabayashi
2005
2005, vol.23, no.3
Role of C{sub}2F{sub}4, CF{sub}2, and ions in C{sub}4F{sub}8/Ar plasma discharges under active oxide etch conditions in an inductively coupled GEC cell reactor
Marcos J. Barela; Harold M. Anderson; Gottlieb S. Oehrlein
2005
2005, vol.23, no.3
Development of low temperature silicon oxide thin films by photo-CVD for surface passivation
Sumita Mukhopadhyay; Tapati Jana; Swati Ray
2005
2005, vol.23, no.3
Investigation of the nanostructure and wear properties of physical vapor deposited CrCuN nanocomposite coatings
M. A. Baker; P. J. Kench; C. Tsotsos; P. N. Gibson; A. Leyland; A. Matthews
2005
2005, vol.23, no.3
Wettability and thermal stability of fluorocarbon films deposited by deep reactive ion etching
Yan Xin Zhuang; Aric Menon
2005
2005, vol.23, no.3
Discharge mode transitions in low-frequency inductively coupled plasmas with internal oscillating current sheets
Z. L. Tsakadze; K. Ostrikov; E. L. Tsakadze; S. Xu
2005
2005, vol.23, no.3
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