中国机械工程学会生产工程分会知识服务平台

期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2012, vol.30, no.1 2012, vol.30, no.2 2012, vol.30, no.3 2012, vol.30, no.4 2012, vol.30, no.5 2012, vol.30, no.6

题名作者出版年年卷期
Novel light sputter ion pump with neodymium iron boron magnets and the low outgassing bodyTaekyun Ha; C. D. Park; Sukmin Chung20122012, vol.30, no.2
SiCl_4/Cl_2 plasmas: A new chemistry to etch high-k materials selectively to Si-based materialsPaul Bodart; Gilles Cunge; Olivier Joubert; Thorsten Lill20122012, vol.30, no.2
Porous antimony-doped tin oxide cathodes formed by supercritical CO_2 treatment at low temperature for silver electro-depositionW. C. Tien; A. K. Chu; H. Y. Wen; M. Y. Chang; W. Y. Huang20122012, vol.30, no.2
Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodepositionTonmoy Chakraborty; Eric T. Eisenbraun20122012, vol.30, no.2
Commercialization of dye sensitized solar cells: Present status and future research needs to improve efficiency, stability, and manufacturingJason B. Baxter20122012, vol.30, no.2
Characterization and comparison of silicon nitride films deposited using two novel processesVivek Sharma; Adam Bailey; Bill Dauksher; Clarence Tracy; Stuart Bowden; Barry O'Brien20122012, vol.30, no.2
Growth morphology and electrical/optical properties of Al-doped ZnO thin films grown by atomic layer depositionTara Dhakal; Daniel Vanhart; Rachel Christian; Abhishek Nandur; Anju Sharma; Charles R. Westgate20122012, vol.30, no.2
Populations of metastable and resonant argon atoms in radio frequency magnetron plasmas used for deposition of indium-zinc-oxide filmsL. Maaloul; S. Morel; L. Stafford20122012, vol.30, no.2
In situ fabrication of blue ceramic coatings on wrought Al Alloy 2024 by plasma electrolytic oxidationZhijiang Wang; Xueyuan Nie; Henry Hu; Riyad O. Hussein20122012, vol.30, no.2
On the scaling of rf and dc self-bias voltages with pressure in electronegative capacitively coupled plasmasAnkur Agarwal; Leonid Dorf; Shahid Rauf; Ken Collins20122012, vol.30, no.2
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