中国机械工程学会生产工程分会知识服务平台

期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2011, vol.29, no.1 2011, vol.29, no.2 2011, vol.29, no.3 2011, vol.29, no.4 2011, vol.29, no.5 2011, vol.29, no.6

题名作者出版年年卷期
Organic thin film induced substrate restructuring: An STM study of the interaction of naphtho[2,3-a]pyrene Au(111) herringbone reconstructionErin V. Iski; April D. Jewell; Heather L. Tierney; Georgios Kyriakou; E. Charles; H. Sykes20112011, vol.29, no.4
Comparison of methods to determine bandgaps of ultrathin HfO_2 films using spectroscopic ellipsometryMing Di; Eric Bersch; Alain C. Diebold; Steven Consiglio; Robert D. Clark; Gert J. Leusink; Torsten Kaack20112011, vol.29, no.4
Structural and electrical characterization of HBr/O_2 plasma damage to Si substrateMasanaga Fukasawa; Yoshinori Nakakubo; Asahiko Matsuda; Yoshinori Takao; Koji Eriguchi; Kouichi Ono; Masaki Minami; Fumikatsu Uesawa; Tetsuya Tatsumi20112011, vol.29, no.4
Measurement and simulation of spreading current in interlayer dielectric film deposition by plasma-enhanced chemical vapor depositionNoriaki Matsunaga; Hirokatsu Okumura; Butsurin Jinnai; Seiji Samukawa20112011, vol.29, no.4
Modeling of plasma-induced damage and its impacts on parameter variations in advanced electronic devicesKoji Eriguchi; Yoshinori Takao; Kouichi Ono20112011, vol.29, no.4
Surfaces of mixed formulation solder alloys at meltingM. J. Bozack; J. C. Suhling; Y. Zhang; Z. Cai; P. Lall20112011, vol.29, no.4
Observation of NH_2 species on tilted InN (0111) facetsA. R. Acharya; M. Buegler; R. Atalay; N. Dietz; B. D. Thoms; J. S. Tweedie; R. Collazo20112011, vol.29, no.4
Aging mechanism of the native oxide on silicon (100) following atmospheric oxygen plasma cleaningThomas S. Williams; Robert F. Hicks20112011, vol.29, no.4
Plasma enhanced atomic layer deposition of SiN_x:H and SiO_2Sean W. King20112011, vol.29, no.4
Substrate effects on metal-insulator transition characteristics of rf-sputtered epitaxial VO_2 thin filmsYanjie Cui; Shriram Ramanathan20112011, vol.29, no.4
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