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期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2011, vol.29, no.1 2011, vol.29, no.2 2011, vol.29, no.3 2011, vol.29, no.4 2011, vol.29, no.5 2011, vol.29, no.6

题名作者出版年年卷期
Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride: Beam study with CF~+, CF_2~+, CHF_2~+, and CH_2F~+ ionsTomoko Ito; Kazuhiro Karahashi; Masanaga Fukasawa; Tetsuya Tatsumi; Satoshi Hamaguchi20112011, vol.29, no.5
Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and ChallengesH. B. Profijt; S. E. Potts; M. C. M. van de Sanden; W. M. M. Kessels20112011, vol.29, no.5
Kelvin probe force microscopy-based characterization techniques applied for electrostatic MEMS/NEMS devices and bare dielectric films to investigate the dielectric and substrate charging phenomenaUsama Zaghloul; Bharat Bhushan; Fabio Coccetti; Patrick Pons; Robert Plana20112011, vol.29, no.5
Incorporation of hydrogen in CuInSe_2: Improvements of the structureM. V. Yakushev; I. I. Ogorodnikov; V. A. Volkov; A. V. Mudryi20112011, vol.29, no.5
Photovoltaic characteristics of a-Si/β-FeSi_2/c-Si double heterojunction fabricated by magnetron sputteringJiaxiong Xu; Ruohe Yao; Kuiwei Geng20112011, vol.29, no.5
Imaging and phase identification of Cu_2ZnSnS_4 thin films using confocal Raman spectroscopyA. J. Cheng; M. Manno; A. Khare; C. Leighton; S. A. Campbell; E. S. Aydil20112011, vol.29, no.5
Effects of temperature and near-substrate plasma density on the structural and electrical properties of dc sputtered germanium thin filmsKristin M. Pollock; Tobin Kaufman-Osborn; Jonas Hiltrop; James R. Doyle20112011, vol.29, no.5
Inductively coupled plasma etching of graded-refractive-index layers of TiO_2 and SiO_2 using an ITO hard maskAhmed N. Noemaun; Frank W. Mont; Jaehee Cho; E. Fred Schubert; Gi Bum Kim; Cheolsoo Sone20112011, vol.29, no.5
Formation of tetragonal or monoclinic ZrO_2 coatings by oxygen plasma treatment of Zr_(74.7)Cu_(19.7)Nb_(5.6) glassy thin filmsN. T. Panagiotopoulos; J. Kovac; M. Mozetic; P. Patsalas; G. A. Evangelakis20112011, vol.29, no.5
Modelling of fluorine based high density plasma for the etching of silica glassesLudovic Lallement; Ahmed Rhallabi; Christophe Cardinaud; Marie Claude Peignon Fernandez20112011, vol.29, no.5
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